P388 – 4″ HV thermal evaporation OUT e.V.
Application
HV thermal evaporation system for thin film deposition at 4″ substrates
Year of delivery
2014
Installation site
OUT e.V. Berlin, Germany
Design Features
- HV thin film deposition system with single thermal evaporation source.
- Sample manipulator with integrated sample shutter and maximal sample temperature above 600°C.
- Thickness monitor for deposition rate measurement and end point detection.
Special Features
- Ports for optional in situ analytic (e.g. ellipsometry).
- Different sample sizes from 4″ wafer down to 10mm x 10mm samples can be handled (using different kind of sample adapters).
Outer Dimensions
Technical specifications and performance values
General
Evaporation chamber
Size
About 380 mm width, about 520 mm depth, about 500 mm height (D-shape chamber with door)
Material
stainless steel
Vacuum
Evaporation chamber
Base pressure
< 8 *10-8 mbar
Pump down time
19 hours to < 2 * 10-7 mbar
Chamber pumping
Turbo pumping stage, chamber door differentially pumped by dry foreline pump
Manipulator features
Evaporation chamber
Sample size
diameter max. 4″ substrate
Motion axes
Pneumatic sample shutter (part of the manipulator head)
Temperatures
Room temperature (not stabilized) up to 600°C at sample
Performance test results
Chamber pump down
Long time sample heating
