P397 – 7″x7″ HV e-beam deposition system CEITEC
Application
HV e-beam deposition system for thin film and glacing angle deposition at maximal 7″x7″ substrate.
Year of delivery
2015
Installation site
CEITEC, Brno, Czech republic
Design Features
- HV e-beam deposition system for thin film deposition.
- Moveable multi pocket e-beam source.
- Motorized pocket exchange and z motion for automatic deposition processes.
- Thickness controller incl. rate regulation and end point detection.
- Thickness sensor with shutter for extended crystal life time when rate regulation is not active.
- Fully motorized 2 axes sample manipulator with integrated pneumatic sample shutter and maximal sample temperature well above 800°C.
- Integrated bake out system.
- Load lock chamber including sample preparation stage.
- Dosing gas inlet valve for oxydation or nitration.
- Optional:
- Ion source for sample precleaning and mild etching.
- Two effusion cells.
- Thermal evaporation source.
Special Features
- Very large distance variation between sample and e-beam source possible (mechanically limited to 190mm travel).
- Different sample sizes from 7″ x 7″ sample plates down to 10mm x 10mm wafer pieces can be handled (using different kind of sample adapters).
Outer Dimensions
Technical specifications and performance values
General
E-Beam chamber
Size
About 540 mm width, about 590 mm depth, about 1050 mm height (D-shape chamber with door)
Material
stainless steel
Load lock chamber
Size
250 mm diameter, about 250 mm height
Material
stainless steel
Vacuum
E-Beam chamber
Base pressure
< 5 * 10-8 mbar
Pump down time
3.25 hours to < 10-7 mbar
Chamber pumping
Turbo pumping stage, chamber door differentially pumped by dry foreline pump
Bake out
< 120°C
Load lock chamber
Base pressure
< 10-7 mbar
Pump down time
0.5 hours to < 5 * 10-7 mbar
Chamber pumping
Turbo pumping stage with dry foreline pump
Manipulator features
E-Beam chamber
Sample size
max. 7″x7″ substrate
Motion axes
2 motorized axes (manipulator arm tilting and (continous) rotation of the sample stage)
Sample shutter and sample release unit (part of the manipulator head), both pneumatically driven.
Temperatures
Room temperature (not stabilized) up to 1000°C
Special features
Sample tilting enables glace angle deposition
Sample preparation features
Load lock chamber
Oxydation / Nitration
max. 10-2 mbar neutral oxygen / nitrogen gas (using a manual gas dosing valve)
Performance test results
Chamber pump down
Long time sample heating
